The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2001

Filed:

Jul. 01, 1999
Applicant:
Inventors:

Daniel R. Neal, Tijeras, NM (US);

Ron R. Rammage, Tijeras, NM (US);

Darrell J. Armstrong, Albuquerque, NM (US);

William T. Turner, Albuquerque, NM (US);

Justin D. Mansell, Palo Alto, CA (US);

Assignee:

Wavefront Sciences, Inc., Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/20 ;
U.S. Cl.
CPC ...
G01J 1/20 ;
Abstract

A Shack-Hartmann wavefront sensor having an aperture which is smaller than the size of an object being measured is used to measure the wavefront for the entire object. The wavefront sensor and the object are translated relative to one another to measure the wavefronts at a plurality of subregions of the object. The measured wavefronts are then stitched together to form a wavefront of the object. The subregions may overlap in at least one dimensions. A reference surface may be provided to calibrate the wavefront sensor.


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