The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2001
Filed:
Apr. 22, 1999
Applicant:
Inventor:
Bruce L. Hayes, Boise, ID (US);
Assignee:
Micron Technology, Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/30 ;
Abstract
A wafer treatment method semiconductor wafer is disclosed. The method may include supporting the wafer and flowing a continuous sheet of liquid in a predetermined non-perpendicular orientation relative to the wafer. The continuous sheet of liquid is applied to the wafer.