The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2001

Filed:

Jun. 18, 1996
Applicant:
Inventors:

Douglas Craig Bossen, Poughkeepsie, NY (US);

Chin-Long Chen, Wappingers Falls, NY (US);

Fredrick Hayes Dill, South Salem, NY (US);

Douglas Seymore Goodman, Yorktown Heights, NY (US);

Mu-Yue Hsiao, Poughkeepsie, NY (US);

Paul Vincent McCann, Hopewell Junction, NY (US);

James Michael Mulligan, Poughguag, NY (US);

Ricky Allen Rand, Somers, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 7/10 ;
U.S. Cl.
CPC ...
G06K 7/10 ;
Abstract

A single width bar code exhibiting inherent self clocking characteristics is provided so as to be particularly useful in the identification of semiconductor wafers in very large scale integrated circuit manufacturing processes. The codes described herein are robust, reliable and highly readable even in the face of relatively high variations in scanning speed. The codes are also desirably dense in terms of character representations per linear centimeter, an important consideration in semiconductor manufacturing wherein space on the chips and the wafer is at a premium. Additionally, a preferred embodiment of the present invention exhibits a minimum number for the maximum number of spaces between adjacent bars in code symbol sequences.


Find Patent Forward Citations

Loading…