The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2001
Filed:
Dec. 07, 1998
Diana M. Schonauer, San Jose, CA (US);
Steven C. Avanzino, Cupertino, CA (US);
Kai Yang, Fremont, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
The formation and/or growth of dendrites emanating from Cu or Cu alloy lines into a bordering open dielectric field are prevented or substantially reduced by chemically removing a portion of the surface from the dielectric field and from between the lines after CMP by immersion in and/or double sided brush scrubbing with a chemical agent. Embodiments include removing controlled portions up to 50 Å of silicon oxide by immersion in and/or double sided brush scrubbing with a solution containing ammonium fluoride, diammonium hydrogen citrate, triammonium citrate, a surfactant and dionized water.