The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2001
Filed:
Dec. 18, 1997
Shang-Hong Lai, Plainsboro, NJ (US);
Ming Fang, Cranbury, NJ (US);
Siemens Corporate Research, Inc., Princeton, NJ (US);
Abstract
An adaptive hierarchical neural network based system with online adaptation capabilities has been developed to automatically adjust the display window width and center for MR images. Our windowing system possesses the online training capabilities that make the adaptation of the optimal display parameters to personal preference as well as different viewing conditions possible. The online adaptation capabilities are primarily due to the use of the hierarchical neural networks and the development of a new width/center mapping system. The large training image set is hierarchically organized for efficient user interaction and effective re-mapping of the width/center settings in the training data set. The width/center values are modified in the training data through a width/center mapping function, which is estimated from the new width/center values of some representative images adjusted by the user. The width/center mapping process consists of a global spline mapping for the entire training images as well as a first-order polynomial sequence mapping for the image sequences selected in the user's new adjustment procedure.