The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2001

Filed:

Sep. 30, 1998
Applicant:
Inventors:

Mark I. Gardner, Cedar Creek, TX (US);

Mark C. Gilmer, Austin, TX (US);

Assignee:

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/900 ;
U.S. Cl.
CPC ...
H01L 2/900 ;
Abstract

The present invention is directed to a semiconductor device having an improved structure for isolating transistors formed on a semiconductor substrate, and a method for making same. The device is comprised of a semiconductor device having first and second recesses formed in the substrate of the device. The inventive method disclosed herein comprises forming first and second recesses in the substrate of the device. The first width of the first recess is formed such that it is greater than the second width of the second recess, and the second depth of the second recess is formed such that it is greater than the first depth of the first recess.


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