The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Dec. 11, 1998
Applicant:
Inventors:
Scott A. Chalmers, La Jolla, CA (US);
Randall S. Geels, San Diego, CA (US);
Assignee:
Filmetrics, Inc., San Diego, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/102 ; B24B 4/900 ;
U.S. Cl.
CPC ...
G01B 1/102 ; B24B 4/900 ;
Abstract
Methods and apparatus for film measurement and endpoint detection in a noisy environment, such as CMP processing of semiconductor wafers, are disclosed, characterized by the use of spectral analysis of intensity data derived from light reflected off the sample to estimate film thickness or detect an endpoint condition.
Chalmers, Scott. (2001). Rapid and accurate end point detection in a noisy environment (U.S. Patent No. 6172756). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6172756
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile