The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2001
Filed:
Aug. 12, 1998
John W. Vanderpot, Boxford, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
An ion beam scanning system includes an ion beam processing chamber and a shaft extending through two opposing walls of the chamber. Linear gas bearings couple the shaft through the walls to provide for rotational and linear movement of the shaft. An ion source and scanning unit generates an ion beam and scans a workpiece mounted on the shaft. The ion beam irradiates the workpiece at a selected angle, relative to the surface normal of the workpiece, defined by rotation of the shaft. A linear drive linearly moves the shaft so that the ion beam creates a raster pattern on the workpiece. The system can include counter-balancing of the shaft to ease the work of the drive units. Batch processing can be achieved through a rotatable disc mounted to the shaft, whereby each workpiece is processed by rotation of the disc and simultaneous linear motion of the shaft. One processing system can also include two mounting structures, one for loading/unloading during simultaneous processing of workpieces on another structure.