The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2000
Filed:
May. 21, 1999
Sau-Ching Wong, Hillsborough, CA (US);
SanDisk Corporation, Campbell, CA (US);
Abstract
An SRAM-based CAM cell and CAM array architecture reduce transistor count and memory size by replacing pass transistors and search transistors of conventional SRAM-base CAM cells with a pair of transistors having gates coupled to bit lines. The two bit-line-controlled transistors in a CAM cell are between storage nodes and a word/match line for the CAM cell. The sizes of pull-up and pull-down devices in the CAM cells are selected so that grounding a storage node to a word/match line through one of the two bit-line-controlled transistors can change the bit stored in a CAM cell, but applying a voltage (near the supply voltage) from the word/match line through either of the two bit-line-controlled transistors to a storage node cannot change the bit or data stored in a CAM cell. Accordingly, a write operation grounds a selected word/match line and applies a voltage to the unselected word/match lines. A search operation charges all word/match lines and senses the word/match lines. Addition of a mask element that controls the connection of the CAM cell to the word/match line can convert a binary CAM architecture to a ternary CAM architecture. The mask element optionally includes circuitry that causes the mask element to power up in a known state. Within the ternary CAM cell, a bypass transistor can be provide to bypass the effect of the mask element and facilitate write operations or temporarily suspend local masking.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile