The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Aug. 11, 1998
Applicant:
Inventor:
Wei-Shang King, Hsinchu, TW;
Assignee:
Mosel Vitelic Inc., , TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438253 ; 438255 ; 438398 ; 438665 ;
Abstract
A method is provided for manufacturing a capacitor having a generally crosssectionally modified T-shaped structure with a rough surface to serve as a lower capacitor plate, and having another dielectric layer and another conducting layer to construct an upper capacitor plate. Such a structure not only significantly increases the surface area of the capacitor but is conducive to the subsequent planarization process.
King, Wei-Shang. (2000). Manufacturing process and structure of capacitor (U.S. Patent No. 6153462). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6153462
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile