The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Jan. 22, 1998
Applicant:
Inventors:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430331 ; 134 38 ; 510176 ;
Abstract
A method of removing photo-resist. Acetone, thinner, and deionized water for scrubbing a wafer are used to clean a wafer on which a photo-resist layer is formed, so that thinner and deionized water are mutually dissolvable with acetone as medium. The photo-resist layer is then removed.
Chung, Army. (2000). Method of removing photo-resist (U.S. Patent No. 6153360). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6153360
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile