The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Jun. 02, 1999
Chia-Fang Wu, Tainan, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin Chu, TW;
Abstract
An apparatus for heat treating an object and specifically a substantially flat object described. The apparatus may be a hot plate post-baking apparatus for heat treating a substantially flat object such as a photomask used in a semiconductor photolithographic process. The apparatus is provided with an upper heat reflector plate that is equipped with upwardly curved edge portions such that the amount of heat reflected by the reflector can be controlled and the center region on the substantially flat object can be temperature compensated for achieving more uniform temperature profile across the entire surface of the mask. By utilizing the heat reflector plate in a post-baking apparatus, the normally observed 5.degree. C. temperature difference across a mask surface is substantially eliminated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile