The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Jan. 07, 1999
Mark I Gardner, Cedar Creek, TX (US);
Thien T Nguyen, Austin, TX (US);
Charles E May, Gresham, OR (US);
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
The present invention is directed to a transistor formed above a layer of a dielectric material and a method of making same. In one illustrative embodiment, the method comprises forming a first layer of dielectric material, forming a plurality of source/drain regions comprised of polysilicon above said first layer of dielectric material and between said source/drain regions, and forming a second layer of dielectric material above said first layer of dielectric material. The method further comprises forming a layer of polysilicon above the second layer of dielectric material, forming a gate dielectric above said layer of polysilicon, and forming a gate conductor above said gate dielectric. The transistor structure is comprised of a first layer of dielectric material, a plurality of source/drain regions positioned above the first layer of dielectric material, a second layer of dielectric material positioned above the first layer of dielectric material, and a layer of polysilicon positioned above the second layer of dielectric material and between said source/drain regions. The structure further comprises a gate dielectric positioned above the layer of polysilicon and a gate conductor positioned above the gate dielectric.