The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Dec. 15, 1998
Applicant:
Inventors:
Gail D Shelton, Colorado Springs, CO (US);
Gayle W Miller, Colorado Springs, CO (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ; B08B / ;
U.S. Cl.
CPC ...
436 80 ; 436 49 ; 134-6 ;
Abstract
Radio frequency photo conductive decay is used to monitor a small piece of high-grade silicon to determine if copper contamination has been removed from a probe tool. A probe tool is placed in contact with a small 'waferette' of silicon repeatedly until the copper signal is diminished, indicating that the tool may be used for other products without concern for copper contamination.
Shelton, Gail. (2000). Copper contamination control of in-line probe instruments (U.S. Patent No. 6150175). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6150175
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile