The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Aug. 20, 1998
Shigetaka Kumashiro, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A method of simulating an impact ionization phenomenon of a semiconductor device, by which an electric characteristic concerning the impact ionization phenomenon of the semiconductor device is obtained by setting a mesh in a space and by solving a Poisson equation, an electron current continuity equation and a hole current continuity equation which are discretized by what is called a control volume method. Further, regarding a current density defined on a mesh edge connecting adjacent mesh points, different values are used as an evaluation value of the current density at an upstream side, at which a carrier is cased to drift, and an evaluation value of the current density at a downstream side, respectively. Moreover, the difference between the current densities respectively obtained at the upstream side and the downstream side are set in such a manner as to be equal to a multiplication carrier current density caused by impact ionization of the carrier in the control volume corresponding to an edge of the mesh.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile