The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2000
Filed:
Sep. 03, 1998
Applicant:
Inventors:
Bruce L Hayes, Boise, ID (US);
Greg Montanino, Mtn. Home, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438782 ; 427240 ; 118 52 ;
Abstract
Methods are disclosed for processing a semiconductor wafer. The methods may include removing first and second amounts of liquid from the lower surface of the wafer. The subject invention may also comprise methods for removing a liquid from a semiconductor wafer surface that include contacting the semiconductor wafer surface with an annular barrier formed in a ring member and draining the liquid contacting the annular barrier from the ring member. Other methods are disclosed for applying a solvent to a surface coating to remove excess therefrom and draining the solvent and liquid from a wafer support member.