The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Aug. 21, 1995
Tetsu Sato, Tochigi, JP;
Takahiro Inakuma, Tochigi, JP;
Yukio Ishiguro, Tochigi, JP;
Naoji Komeya, Tokyo, JP;
Masami Shibamoto, Tokyo, JP;
Yukio Matsuda, Tokyo, JP;
Kagome Kabushiki Kaisha, Aicha, JP;
Abstract
An apparatus for processing a high-pressure liquid material has a high-pressure vessel, a pressurizing assembly for supplying a liquid material to the high-pressure vessel in order to allow the high-pressure vessel to process the liquid material under a high pressure therein, a depressurizing assembly for receiving and depressurizing the processed liquid material supplied under a high pressure from the high-pressure vessel, and a working fluid control system for controlling the depressurizing assembly. The depressurizing assembly has a plurality of cylinder device comprising respective pairs of interlinked pistons which define, in the cylinder devices, respective processing pressure chambers for selectively receiving the liquid material from the high-pressure vessel, and respective working pressure chambers for selectively receiving a working fluid from the working fluid control system. The working fluid control system brings one of the working pressure chambers into communication with at least another one of the working pressure chambers to pass the working fluid therebetween for causing the cylinder device to successively draw, depressurize, and discharge the liquid material in respective suction, depressurization, and discharge modes.