The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Jul. 08, 1999
Pavol Hrkut, Bratislava, SK;
Peter Hudek, Bratislava, SK;
Ivaylo W Rangelow, Kassel, DE;
Hans Loschner, Vienna, AT;
IMS Ionen-Mikrofabrikations Systeme GmbH, Vienna, AT;
Universitat Gesamthochschule Kassel, Kassel, DE;
Ustav Pocitacovych systemov, Slovenska adademia vled, Bratislava, SK;
Abstract
In order to process a carbon film carbon is deposited on a substrate by sputtering from a carbon sputter target in a gas mixture which contains nitrogen in a minimum proportion of 20% and a sputter gas at a predetermined gas pressure and the substrate is then subjected under a high vacuum to thermal treatment at a temperature above 100.degree. C. The carbon films produced in this manner comprise a fiber and/or tube structure which extends substantially perpendicular to the film.