The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Sep. 15, 1998
David L Klein, Palo Alto, CA (US);
Gerard H Vurens, Palo Alto, CA (US);
HDI Instrumentation, Santa Clara, CA (US);
Abstract
An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes an intensity stabilized light source configured to generate a stabilized light beam, a polarizing element for polarizing the light beam emanating from the light source, and a detection system for measuring the light reflected from the substrate The measurement system includes a polarizing beam-splitter for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light and a third detector for measuring either the phase difference between the s-polarized light and the p-polarized light or the reflection angle of the light reflected from the substrate. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized and either the phase-difference or the reflection angle to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.