The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
May. 12, 1999
Hsin-Tang Peng, Hsinchu, TW;
Mosel Vitelic Inc., Hsinchu, TW;
Abstract
A monitor method and apparatus for overlay alignment of a stepper includes a reticle having a plurality of align marks for the stepper to expose a plurality of stepping exposing patterns on an initial layer of a wafer in a step-and-repeat manner. Each subsequent stepping exposing pattern has at least one align mark overlaying with one of the align marks of a previous/adjacent stepping exposing pattern. A triangle geometric equation may be used to calculate the deviation angle resulting from stepping direction and reticle position (e.g., reticle skew angle) so that overlay accuracy against the initial layer may be monitored effectively for enhancing wafer production yield.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile