The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
May. 27, 1998
Tsann Lin, Saratoga, CA (US);
Daniele Mauri, San Jose, CA (US);
Joseph Francis Smyth, Los Altos, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An SV sensor having a reference (pinned) layer formed of a first high uniaxial anisotropy ferromagnetic material, such as Co--Fe, and a keeper layer formed of a second high uniaxial anisotropy ferromagnetic material, such as Ni--Fe--Nb. Lapping induced stress in the Co--Fe layer having high positive magnetostriction generates a stress-induced uniaxial anisotropy field in the reference layer resulting in enhanced reference layer magnetization. This uniaxial anisotropy field is capable by itself of maintaining a substantial transverse reference layer saturation even at elevated temperatures. Lapping induced stress in the Ni--Fe--Nb layer having high positive magnetostriction generates a stress-induced uniaxial anisotropy field in the keeper layer providing more uniform magnetization and therefore better flux cancellation. The high electrical resistivity of the Ni--Fe--Nb keeper layer has the further benefit of reducing sense current shunting by the keeper layer.