The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Dec. 18, 1998
Applicant:
Inventors:
Paul K Chu, Kowloon, HK;
Chung Chan, Newton, MA (US);
Assignee:
Silicon Genesis Corporation, Campbell, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
20429815 ; 20429802 ; 20429804 ; 20429805 ; 20429826 ; 20429811 ; 118728 ; 118733 ; 1187 / ; 1187 / ;
Abstract
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. The system (200) also includes a silicon liner, which is used to line inner portions of the chamber walls.