The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Mar. 31, 1999
Yi-yang Zhou, McKinney, TX (US);
Eugene C Davis, Sherman, TX (US);
MEMC Electronic Materials, Inc., St. Peters, MO (US);
Abstract
A pad shaping tool for shaping a polishing pad. The tool includes a disk having a first side and a second side and at least two discontinuous pad shaping surfaces located in spaced apart positions relative to each other on the first side of the disk. The pad shaping surfaces are simultaneously engageable with a polishing surface of the polishing pad for shaping the polishing surface as the pad rotates relative to the tool to change a cross sectional profile of the polishing surface from a curved shape to a flatter shape. A process for reconditioning the polishing pad on a rotatable platform of a wafer polishing machine includes the steps of engaging the pad shaping tool with the polishing surface of the pad such that at least two discontinuous pad shaping surfaces of the tool simultaneously engage the polishing surface, and rotating the polishing pad while preventing translational movement of the tool relative to the pad so that the tool shapes the polishing surface of the pad to be more nearly flat.