The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2000
Filed:
Jul. 06, 1998
Richard S Osugi, Milpitas, CA (US);
Ronald J Nagahara, San Jose, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A process for modifying an alignment mark is described. The process includes: (i) fabricating the alignment mark on an integrated circuit substrate surface, which alignment mark includes an alignment mark fill material of defined composition; and (ii) introducing a step in the alignment mark by polishing the integrated circuit substrate surface and removing at least some of the alignment mark fill material from the integrated circuit substrate to form a modified alignment mark. The modified alignment mark is capable of allowing an alignment tool to detect the modified alignment mark when the modified alignment mark is covered by an opaque layer and thereby align a first layer of the integrated circuit substrate to the opaque layer that is disposed above the first layer.