The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Nov. 03, 1997
James F Vanell, Tempe, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A chemical mechanical planarization tool (21) comprises a platen (22), a wafer carrier arm (31), a carrier assembly (37), a conditioning arm (28), and an end effector (33). A slurry delivery system (51) reduces waste by providing polishing chemistry at a minimum required delivery rate that ensures consistent wafer planarization. The slurry deliver system comprises a check valve (52), a diaphragm pump (53), a check valve (54), a back pressure valve (55), and a dispense bar (58). The diaphragm pump (53) provides a precise volume of polishing chemistry with each pump cycle, independent of input pressure. The check valves (52,54) prevent reverse flow of the polishing chemistry through the diaphragm pump (53). Back pressure valve (55) creates a pressure differential across the check valve (54) to prevent the flow of polishing chemistry during a downstroke of the diaphragm pump (53). The polishing chemistry is dispensed onto a polishing media from dispense bar (58).