The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Feb. 09, 1993
Tadahiro Ohmi, Sendai-shi, Miyagi-ken, JP;
Hisayuki Shimada, Sendai, JP;
Shigeki Shimomura, Sendai, JP;
Akiyoshi Suzuki, Tokyo, JP;
Mamoru Miyawaki, Isehara, JP;
Miyoko Noguchi, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Other;
Abstract
A lithography process for forming a pattern having different sizes or different shapes of pattern components, comprises steps of exposing a resist to a predetermined light pattern by modified illumination, and removing, at least one step of forming the resist pattern, a region of the resist by employing a lithography-developing solution containing a surfactant, the surfactant being capable of promoting dissolution of a smaller pattern component to be removed of the resist. The surfactant is represented by the general formula below: