The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Apr. 13, 1993
Applicant:
Inventor:
Glenn Edward Storm, Ridgefield, CT (US);
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 428 14 ;
Abstract
A pattern mask pellicle comprising a peripheral frame, a transparent film extending across the top peripheral surface of the frame, and a peripheral gasket adhered to the bottom peripheral surface of the frame, the frame/gasket assembly including at least one tacky, continuous, tortuous path connecting an opening in the interior wall of the assembly with an opening in the exterior wall of the assembly. At least one pellicle is mounted on a pattern mask substrate to protect the pattern area during imaging in the production of integrated circuits.