The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Jun. 29, 1998
Applicant:
Inventors:
Frank Hintermaier, Munchen, DE;
Carlos Mazure-Espejo, Zorneding, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438653 ; 438656 ; 438669 ; 438672 ; 438674 ; 438675 ;
Abstract
A barrier layer is formed on the contact plug of the semiconductor body. The barrier layer prevents oxidation of the contact plug. The barrier layer is produced by chemically reacting a prestructured metallic transition material with one or more reaction partners.
Hintermaier, Frank. (2000). Method of producing a barrier layer in a semiconductor body (U.S. Patent No. 6100187). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6100187
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile