The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Jan. 20, 1998
Edward J Nowak, Essex, VT (US);
Xiaowei Tian, Essex Junction, VT (US);
Minh H Tong, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A diffusion resistor is provided that utilizes the block mask to cover only the intrinsic polysilicon gate region. The n-type source/drain doping is implanted in the contact regions, but not in the intrinsic polysilicon gate region. A N-type (or P-type) diffusion resistor in P-well (or N-well) is provided that utilizes a block mask to cover only the intrinsic polysilicon gate region. The N-type (or P-type) source/drain doping is implanted in the contact regions but not in the intrinsic polysilicon gate region. The P-well (or N-well) block mask is used to keep the P-well (or N-well) from forming under the buried resistor. This makes the parasitic capacitance of the diffusion junction very low. Also provided is a buried capacitor and method of making both a buried resistor and a buried capacitor.