The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2000

Filed:

May. 19, 1999
Applicant:
Inventors:

Alain E Kaloyeros, Slingerlands, NY (US);

John T Welch, Albany, NY (US);

Paul J Toscano, Schenectady, NY (US);

Rolf Claessen, Albany, NY (US);

Andrei Kornilov, Kiev, UA;

Kulbinder Kumar Banger, Albany, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
427250 ; 427123 ; 427124 ; 427125 ;
Abstract

Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.


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