The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2000
Filed:
Nov. 03, 1998
Applicant:
Inventors:
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ;
Abstract
A dry etching apparatus used for manufacture of a semiconductor device includes a plasma confinement ring secured by screws to a cathode, an anode, and a metal focusing ring extending around the anode for enhancing the uniformity of the plasma. The screws are located a maximum distance away from the focusing ring. Thus, micro-arcing is prevented from occurring between the focusing ring and the screws. The confinement ring is also designed to distribute the plasma stream only onto the wafer, so that the generation of contamination particles is suppressed during etching.