The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2000
Filed:
Mar. 26, 1999
Applicant:
Inventors:
Naoki Matsuda, Yokohama, JP;
Yoshiyuki Ohta, Sagamihara, JP;
Kenya Ito, Fujisawa, JP;
Takahiro Nanjo, Yokohama, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134153 ; 134157 ; 134172 ; 134902 ; 134198 ; 118321 ; 239264 ;
Abstract
A cleaning apparatus is used for cleaning a substrate such as a semiconductor wafer, a glass substrate, or a liquid crystal panel with a cleaning member. The cleaning apparatus includes: a holding mechanism for holding a workpiece, an arm movable relative to the workpiece, a cleaning member mounted on the arm for cleaning the workpiece held by the holding mechanism, a moving mechanism for vertically moving the cleaning member with respect to the workpiece held by the holding mechanism, and a controller for controlling the moving mechanism to adjust the cleaning member to a setting height.