The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
Dec. 15, 1998
Gail D Shelton, Colorado Springs, CO (US);
Gayle W Miller, Colorado Springs, CO (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method for composing a low dielectric thermally conductive thin film is disclosed. A layer of precursor material is first deposited on a silicon substrate. Without affecting its structure and porosity, the layer of silica precursor material is then dried and becomes a layer of porous silica film. Subsequently, the silicon substrate is exposed to a methane gas atmosphere at a temperature of approximately 200-350.degree. C., during which methane gas molecules are oxidized locally to liberate carbon atoms. Some of the liberated carbon atoms will bond to the interior of the porous silica film. The carbon atoms from the methane gas molecules then permeate the nanopores within the porous silica film such that the entire nanostructure of the porous silica film is carbidized. As a result, a composite porous silica film, which may serve as a dielectric layer within an interconnect structure, is formed.