The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
Jun. 22, 1998
Applicant:
Inventors:
Dashun Steve Zhou, Sunnyvale, CA (US);
Solomon I Beilin, San Carlos, CA (US);
James J Roman, Sunnyvale, CA (US);
Assignee:
Fujitsu Limited, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-6 ; 134 32 ; 134 34 ;
Abstract
A chemical mechanical cleaning method utilizes an ammonium persulphate solution with simultaneous mechanical brushing to remove residual slurry particles from copper surfaces. The pH of the solution is selected to electrostatically repel charged slurry particles from the copper surface.
Zhou, Dashun. (2000). Cleaning method using ammonium persulphate to remove slurry particles (U.S. Patent No. 6090214). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6090214
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile