The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
Apr. 24, 1998
Applicant:
Inventor:
Hiroyuki Itoh, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 30 ; 355 52 ; 355 53 ; 355 55 ;
Abstract
An exposure apparatus includes a stage for holding a substrate at an exposure station, an arm mechanism for conveying a substrate to be exposed, onto the stage, and a sensor provided on one of the stage and the arm mechanism, for measuring temperature of the substrate to be exposed. On the basis of the measured temperature, pattern projection magnification to the workpiece, for example, is corrected.
Itoh, Hiroyuki. (2000). Exposure apparatus and device manufacturing method (U.S. Patent No. 6088080). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6088080
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile