The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
Feb. 16, 1999
Applicant:
Inventor:
Hsiu-Wen Huang, Kaoshiung, TW;
Assignee:
United Semiconductor Corp., Hsinchu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438682 ; 438649 ;
Abstract
A method for manufacturing a bit line. A substrate having a dielectric layer on the substrate and a contact hole penetrating through the dielectric layer and exposing portions of the substrate is provided. A patterned conductive layer is formed on the dielectric layer and fills the contact hole. The surface of the patterned conductive layer is converted into an oxide layer. The oxide layer is removed. A silicide layer is formed on the patterned conductive layer.