The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Aug. 19, 1993
Samir S Shiban, Beaverton, OR (US);
Daniel G Morgan, Tigard, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A method for reacting a pyrophoric gas is disclosed. In the method, a stream of spent process gas from, for example, a chemical vapor deposition process containing silane is mixed with the oxidizing gas flow such as air. The combined flow is sufficiently turbulent to provide for a controlled reaction of the silane. The method may be used for a wide range of pyrophoric gas flow rates, such that the risk of explosion is eliminated. The reaction between silane and oxygen occurs spontaneously. Because the reaction proceeds spontaneously, no ignitor is necessary. Additionally, the method requires no external fuel source and, due to the turbulence proceeds even in conditions were no flame is generated.