The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Sep. 24, 1997
Applicant:
Inventors:
Maria Huffman, Germantown, MD (US);
Palanikumaran Sakthivel, Gaithersburg, MD (US);
Teresa Zimmerman, Baltimore, MD (US);
Thomas Noble, New Market, MD (US);
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ; C25F / ;
U.S. Cl.
CPC ...
134-11 ; 134-12 ; 438725 ; 1187 / ;
Abstract
A method for removing material from a substrate. A plasma is generated in a plasma generating and discharge device including a sapphire plasma tube. At least one fluorine-containing compound is introduced into the plasma. A forming gas is introduced into the plasma. The plasma is directed toward the material to be removed from the substrate.
Huffman, Maria. (2000). Fluorine assisted stripping and residue removal in sapphire downstream (U.S. Patent No. 6082374). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6082374
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile