The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2000

Filed:

Jan. 21, 1999
Applicant:
Inventor:

Suguru Tabara, Hamamatsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438734 ; 438720 ; 438742 ; 216 67 ; 216 77 ;
Abstract

A wiring pattern forming method includes the step of: forming resist patterns on an aluminum or aluminum alloy conductive layer, the resist patterns including a low density pattern area and a high density pattern area; etching and removing a portion of a thickness of the conductive layer by an etching process presenting anti-microloading effect by using the resist patterns as an etching mask, and etching and removing another portion of the thickness of the conductive layer by an etching process presenting microloading effect by using the resist patterns as an etching mask. A method of forming an aluminum or aluminum alloy wiring pattern is provided which can maintain a high etching rate and reduce electron shading damage.


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