The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2000
Filed:
Oct. 27, 1998
Shigetaka Kumashiro, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A total impurity concentration which is a result of the solution of a diffusion equation at the immediately preceding point of time is used to solve, for each mesh point, an equation for determining an electrically active impurity concentration to approximately determine an electrically active impurity concentration. A ratio between the approximate value of the electrically active impurity concentration and the total concentration of the impurities at the preceding point of time is determined for each mesh point. A value of the ratio is determined by interpolating values at mesh points at the opposite ends of each mesh branch. A diffusion equation which includes the total concentration of the impurities as a variable and employs an effective diffusion constant is solved to determine a total impurity concentration at the present point of time of analysis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile