The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2000
Filed:
Apr. 24, 1997
Edwin J Sarver, Merritt Island, FL (US);
Charles R Broadus, Ogden, UT (US);
Orbtek, Inc., Salt Lake City, UT (US);
Abstract
In an inventive method for mapping the topography of an eye, elevation measurements of the eye are collected using a slit beam diffuse reflection system, such as an ORBSCAN.TM. device. An approximating b-spline surface is then fitted to the elevation measurements. Slope measurements of the eye are collected using a Placido-based reflective system, but the slope measurements are referenced to points on the b-spline surface, rather than to points approximated using the conventional constant curvature method, so the measurements have substantially improved accuracy. The elevation and slope measurements are then blended using weighted least squares fitting techniques. A new b-spline surface is fitted to the blended measurements, with the new surface having substantially improved accuracy in depicting the actual topography of the eye as a result of the elevation-improved accuracy of the slope measurements.