The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Aug. 21, 1997
Applicant:
Inventors:
Assignee:
Rodel Holdings, Inc., Wilmington, DE (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23H / ; B23H / ; C25F / ; C25F / ;
U.S. Cl.
CPC ...
205655 ; 205674 ; 205675 ; 205684 ; 216 94 ;
Abstract
A method is provided for photochemical polishing of a silicon wafer using electromagnetic waves within the spectrum of 150 to 2000 nanometers wavelength. A photochemical polishing apparatus is also disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.