The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Apr. 22, 1998
Wen-Liang Fang, Hsinchu, TW;
Ching-Chiy Cheng, Hsinchu Hsien, TW;
Richard Leu, Hsinchu Hsien, TW;
Kuo-Feng Huang, Chu-Pei, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A jet-cleaning device for a developing station, especially suitable for installing on a wafer back cleaning ring of a CLEAN TRACK MK-V developing station. The jet-cleaning device is used for cleaning the wafer back of a wafer mounted above a spinner. The jet-cleaning, device comprises a jet-cleaning block and a vertical nozzle. The jet-cleaning block has a nozzle groove having an inlet for pumping in a cleaning solution. The vertical nozzle is connected to the nozzle groove for forming a vertical jet of the cleaning solution so that waste liquid on a wafer back can be removed.