The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2000
Filed:
Apr. 09, 1999
Applicant:
Inventors:
Thomas E Dinan, Danbury, CT (US);
Swami Mathad, Poughkeepsie, NY (US);
Paul A Totta, Poughkeepsie, NY (US);
Horatio S Wildman, Wappingers Falls, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
428402 ; 428357 ; 428403 ; 257772 ; 2281801 ;
Abstract
A method of selectively and simultaneously depositing a non-reactive material such as a polyimide polymer to vertical sidewalls of a mesa-like structure is provided. The method of the present invention is useful in providing a modified mesa-like structure which prevents the flow of a reactive material along the vertical sidewalls of the mesa-like structure.
Dinan, Thomas. (2000). Use of argon sputtering to modify surface properties by thin film (U.S. Patent No. 6068923). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6068923
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile