The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2000
Filed:
Jun. 11, 1998
Applicant:
Inventors:
Jianhui Ye, Singapore, SG;
Mei Sheng Zhou, Singapore, SG;
Assignee:
Chartered Semiconductor Manufacturing, Ltd., Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430313 ; 216 41 ; 430950 ;
Abstract
A method of patterning conductive lines using a bottom anti-reflective coating (BARC) composed of Poly-p-phenylene sulfide (PPS) film 30 formed using a Physical Vapor Deposition (PVD) process. The PPS BARC 30 is easy to remove and has superior planarization. The method comprises: