The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2000

Filed:

Jan. 21, 1999
Applicant:
Inventors:

Hiroyuki Fujimura, Tokyo, JP;

Yoshio Hirayama, Zushi, JP;

Shosaku Fujinami, Tokyo, JP;

Shuichi Nagato, Yokohama, JP;

Tetsuhisa Hirose, Tokyo, JP;

Takahiro Oshita, Yokohama, JP;

Masaaki Irie, Tokyo, JP;

Kazuo Takano, Tokyo, JP;

Toshio Fukuda, Yokohama, JP;

Assignees:

Ebara Corporation, Tokyo, US;

UBE Industries, Ltd., Yamaguchi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ; C01B / ; C01C / ;
U.S. Cl.
CPC ...
423359 ; 4819 / ; 4819 / ; 48DI / ; 252373 ; 4236481 ; 423656 ; 588226 ;
Abstract

A method of treating wastes includes partially combusting the wastes in a fluidized bed reactor at a relatively low temperature followed by separate gasification of gaseous material and char from the first gasification in a separate relatively high temperature reactor. This forms synthesis gas that is cooled, subjected to a conversion operation to produce hydrogen.


Find Patent Forward Citations

Fujimura, Hiroyuki. (2000). Method for treating wastes by gasification (U.S. Patent No. 6063355). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6063355

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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