The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2000
Filed:
May. 19, 1998
Arun K Nanda, Orlando, FL (US);
Laurence D Schultz, Kissimmee, FL (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
The present invention provides a unique polishing apparatus, such as a chemical/mechanical polishing apparatus, that includes a pivoting apparatus having a first end coupled to a carrier head and a second end coupled to a rotatable shaft wherein the pivoting apparatus is configured to exert a pivoting force with respect to the carrier head to pivot the carrier head with respect to the rotatable shaft to more easily break the surface tension formed by the slurry during the polishing process. This system provides a polishing apparatus that can reduce the amount of semiconductor wafer breakage associated with present processes and apparatus.