The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2000
Filed:
Aug. 24, 1998
Andy Chuang, Hsinchu, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of patterning a dummy layer is provided using the dark/clear ratio. First, the area of devices and the area of relevant devices are defined. The relevant devices are usually positioned around the devices. The devices, the relevant devices, and other regions are united according to the design rules to form a non-dummy pattern region. Then a dummy pattern region is defined. There are many dummy bulks in the dummy pattern region. Next, a known dark/clear ratio of the non-dummy pattern region is provided. A density of the dummy patterns is obtained from the known dark/clear ratio, the length of the dummy bulk, the width of the dummy bulk and a equation. The equation is as follows: the known dark/clear ratio=(the length-the parameter)(the width-the parameter)/[the length.times.the width-(the length-the parameter)(the width-the parameter)]. After obtaining the parameter, each dummy bulk is divided into two regions including a clear region and a dark region. A dummy layer is formed in the dark region of the dummy bulk.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile