The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2000
Filed:
Aug. 08, 1997
Henry H Au, San Jose, CA (US);
Other;
Abstract
Accurate measurements of substrate surface curvature are effected by scanning the substrate in a scan direction along a diameter thereof and rotating it during rapid thermal processing (RTP). Rotation of the substrate also achieves more uniform heating of the substrate by exposing it uniformly to the radiant heat sources employed in the processing system. The heat sources are controllably energized in accordance with temperature measurements which provide feedback control for efficient and accurate cycling of the semiconductor wafer. Various methods are contemplated to effect the temperature measurement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile