The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2000
Filed:
Jun. 10, 1998
Chien-Chao Huang, Kaohsiung, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method for producing a phase shifting mask comprising the steps of first forming a phase shifting layer capable of shifting incoming light by a 360.degree. phase shift angle over a transparent substrate, or forming two phase shifting layers, which are each capable of shifting incoming light by a 180.degree. phase shift angle, before carrying out the steps required to fabricate the phase shifting mask in a conventional method. With the additional phase shifting layer or layers, damage to the transparent substrate due to etching is prevented. Moreover, phase errors caused by defective regions in the phase shifting mask can be removed, easily resulting in the formation of a defect-free mask.